2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 1 | PCS | 135.95 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 8 | PCS | 428.77 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 4 | PCS | 117.13 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 4 | PCS | 330.47 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 1 | PCS | 94.12 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 4 | PCS | 137 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 1 | PCS | 135.95 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 4 | PCS | 541.71 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 2 | PCS | 87.85 | TAIWAN | DELHI AIR |
2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | HAO RAY INDUSTRIAL CO LTD | 100 | PCS | 52.29 | TAIWAN | DELHI AIR |