| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 1 | PCS | 1534.16 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 1 | PCS | 135.95 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 2 | PCS | 87.85 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 1 | PCS | 135.95 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 1 | PCS | 94.12 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 2 | PCS | 107.19 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 4 | PCS | 175.69 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 4 | PCS | 117.13 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 4 | PCS | 330.47 | TAIWAN | DELHI AIR |
| 2/19/2024 | 84869000 | Sputtering Target (used in semiconductor and thin film research MEMS Applications (R&D) purpose only) | XXXXXXXXXX | 8 | PCS | 428.77 | TAIWAN | DELHI AIR |