3/31/2024 | 34029013 | -#&Cleaning solution containing nonionic surfactant, HoplaClean EC-60.Tp:Sodium Hydroxide 14%(cas no:1310-73-2);EOPO BLOCK 10%(cas no:9003-11-6) ;LAURYLAMINE 5%(cas no:2016-56-0). 100% new#&KR | XXXXXXXXXX | 2400 | KGM | 6655.92 | South Korea | NA |
3/30/2024 | 34029013 | 24-HD-505J#&Detergent HD-505J used to clean shoe surfaces and soles (main ingredients: Chemical compounds: Potassium Hydroxide, Sodium Tripolyphosphate; Water) (20kg/barrel), HD brand, new product 100%#&KXD | XXXXXXXXXX | 500 | KGM | 665 | VIETNAM | NA |
3/30/2024 | 34029013 | Detergent KT-105 used to clean molds used to produce electronic components (CLEANING AGENT), city: Potassium hydroxide, Polyacrylamide and water, CAS: 1310-58-3,9003-05-8,7732-18- 5. liquid. K signal. 100% New | XXXXXXXXXX | 133 | KGM | 1064 | China | NA |
3/30/2024 | 34029013 | Printing mold cleaner/ TOYOCLEAN CS-718, (ingredients: Potassium hydroxide 3-4%, Aliphatic carboxylate 10-20%, Water 75-80%) CAS code 1310-58-3, 20Kg/can, manufactured by Nippon Hyomen ,100% new | XXXXXXXXXX | 40 | UNA | 5524.64 | Japan | NA |
3/28/2024 | 34029013 | Cleaning solution containing nonionic surfactant, HoplaClean EC-60.Tp:Sodium Hydroxide 14%(cas no:1310-73-2);EOPO BLOCK 10%(cas no:9003-11-6);LAURYLAMINE 5%(cas no:2016-56-0). 100% new#&KR | XXXXXXXXXX | 2400 | KGM | 6655.92 | VIETNAM | NA |
3/28/2024 | 34029013 | J45835#&SGP 2000 printing film surface cleaning chemicals, Ingredients: Triethanol Amine 20~35 %, 2-(2-butoxyethoxy)ethanol 15~30 %, Potassium hydroxide 33~63 %, 100% new | XXXXXXXXXX | 640 | LTR | 9882.176 | South Korea | NA |
3/27/2024 | 34029013 | Electronic component cleaning chemical code HM-T238 (Tetramethylammonium hydroxide- Cas 75-59-2;Water- Cas 7732-18-5), 200l/drum; Manufacturer: Hoimyung Corporation; 100% new#&KR | XXXXXXXXXX | 140 | UNK | 19683.062 | VIETNAM | NA |
3/27/2024 | 34029013 | Printing mold cleaner/ TOYOCLEAN CS-718, (ingredients: Potassium hydroxide 3-4%, Aliphatic carboxylate 10-20%, Water 75-80%) CAS code 1310-58-3, 20Kg/can, manufactured by Nippon Hyomen ,100% new#&JP | XXXXXXXXXX | 40 | UNA | 5524.648 | VIETNAM | NA |
3/27/2024 | 34029013 | 3014195.NVL#&Chemical chemical CHEM_HM-T238_200L used to clean semiconductor wafers (TP:water-CAS:7732-18-5;tetramethylammonium hydroxide -CAS:75-59-2, volume 200L/drum) | XXXXXXXXXX | 28000 | LTR | 19684 | South Korea | NA |
3/27/2024 | 34029013 | .#&Chemical preparation used to lightly wash gold plating layer GS-500 (20L/CAN) (SODIUM HYDROXIDE 2%, SODIUM COMPOUND 3%, Water 95%). 100% new product #&KR | XXXXXXXXXX | 100 | LTR | 446.97 | South Korea | NA |