Get Latest Vietnam Import Data of Integrated silicon solution under HS Code 3824999990

Discover latest Vietnam shipment data of Integrated silicon solution under HS code 3824999990. Find Product description, Price, buyer, supplier name, Port & shipping information. Ultilize these valuable insights for implementing successful marketing strategy. Scale your Business with our authentic Vietnam Import Data.


DATEHS CODEPRODUCT DESCRIPTIONEXPORTERQUANTITYUNITTOTAL VALUE USDORIGIN COUNTRYPORT OF UNLOADING
3/30/20243824999990Oxygen absorber package used in packaging finished products, code OHX400, type 2000cc, TP Silicon dioxide CAS No. 112926-00-8; Manganese monosulfate CAS No. 7785-87-7, 16g/pack, 10 packs/blister, label: LIPMEN, 100% new#&KRXXXXXXXXXX54000PCE47039.4VIETNAMNA
3/30/20243824999990Oxygen absorber package used in packaging finished products, code OHX400, type 2000cc, TP Silicon dioxide CAS No. 112926-00-8;Manganese monosulfate CAS No. 7785-87-7, 16g/pack, 10 packs/blister, manufacturer: LIPMEN, 100% new#&KRXXXXXXXXXX10800PCE9029.88VIETNAMNA
3/29/20243824999990Moisture-proof granules, silicon dioxide content 62.87%; Aluminum oxide 17.7%; Ferric oxide 7.73%; Magnesium oxide 5.29%; Calcium oxide 3.39%; Sodium oxide 1.22%,Potassium oxide 1.80%,7511318. 100% new#&VNXXXXXXXXXX1002PCE330.66VIETNAMNA
3/28/20243824999990Copper plating solution supplement CU AD-1000 (1KG/CAN) (Content: thiourea 0.5%, SODIUM SACCHARIN 0.5%, Water 99%). 100% new product #&KRXXXXXXXXXX10KGM399.2VIETNAMNA
3/28/20243824999990Additive solution for copper electrolysis ELC-MPS-B (new);tp:Ethylenediaminetetraaceticacid tetrasodium salt<40%;Tetrakis(2-hydroxypropyl)-ethylenediamine<8%, water > 51%. 20 liters/barrel#&VNXXXXXXXXXX200LTR491.68VIETNAMNA
3/28/20243824999990Chemical SiO2 (Silic dioxide) 1-2 mm particles. Main ingredient is: Silicon dioxide (99.98%), CAS number: 7631-86-9. Used to coat phone screens and other devices. Manufacturer :DON CO., LTD.100% new item#&KRXXXXXXXXXX1KGM14.2219VIETNAMNA
3/28/20243824999990Additive solution for copper electrolysis ELC-MPS -C, ingredients: Sodium Hydroxide (<30%), Ethylenediaminetetraaceticacid disodium salt (<2%) 20 liters/barrel#&VNXXXXXXXXXX4800LTR5656.32VIETNAMNA
3/28/20243824999990Additive for alloy plating (Ni-P)ENF-M, used in plating industry, liquid form, 20L/can; TP: Sodium hypophosphite monohydrate 20-25%, Ammonium hydroxide Solution 15-20%, Lactic acid 10 -15%,Malic acid 5-10%#&VNXXXXXXXXXX1300LTR4965.48VIETNAMNA
3/28/20243824999990Additive solution for copper electrolysis ELC-MPS-B;tp:Ethylenediaminetetraaceticacid tetrasodium salt<15%;Triethanolamine<5%;Tetrakis(2-hydroxypropyl)-ethylenediamine<35%, water > 45. 20 liters/barrel#&VNXXXXXXXXXX2900LTR7129.36VIETNAMNA
3/28/20243824999990Additive for alloy plating (Ni-P) ENF-B, used in plating industry, liquid form, 20L/can; TP: Sodium hypophosphite monohydrate 45-55%, Ammonium hydroxide Solution 1-2%. 100% new#&VNXXXXXXXXXX1600LTR7151.52VIETNAMNA

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