3/20/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 86132783.08 | Japan | GPKUZMOLOVSKY |
3/20/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 86132783.08 | Japan | GPKUZMOLOVSKY |
3/5/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 86132783.08 | Japan | GPKUZMOLOVSKY |
2/20/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - UNSATURATED HYDROCARBON (CONTENT OF THE MAIN SUBSTANCE 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN THE PRODUCTION OF MICROELECTRONICS, | XXXXXXXXXX | 0 | N/A | 1443838.18 | Taiwan | TAICHUNG |
2/20/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 0 | N/A | 1443838.18 | Taiwan | TAICHUNG |
1/26/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 86132783.08 | Japan | GPKUZMOLOVSKY |
1/17/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - UNSATURATED HYDROCARBON (CONTENT OF THE MAIN SUBSTANCE 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN THE PRODUCTION OF MICROELECTRONICS, | XXXXXXXXXX | 1 | N/A | 1263358.4 | Taiwan | TAICHUNG |
1/17/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 1443838.18 | Taiwan | TAICHUNG |
1/17/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 1443838.18 | Taiwan | TAICHUNG |
1/17/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - UNSATURATED HYDROCARBON (CONTENT OF THE MAIN SUBSTANCE 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN THE PRODUCTION OF MICROELECTRONICS, | XXXXXXXXXX | 1 | N/A | 1263358.4 | Taiwan | TAICHUNG |