| 3/20/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 86132783.08 | Japan | GPKUZMOLOVSKY |
| 3/20/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 86132783.08 | Japan | GPKUZMOLOVSKY |
| 3/5/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 86132783.08 | Japan | GPKUZMOLOVSKY |
| 2/20/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - UNSATURATED HYDROCARBON (CONTENT OF THE MAIN SUBSTANCE 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN THE PRODUCTION OF MICROELECTRONICS, | XXXXXXXXXX | 0 | N/A | 1443838.18 | Taiwan | TAICHUNG |
| 2/20/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 0 | N/A | 1443838.18 | Taiwan | TAICHUNG |
| 2/15/2024 | 2903590000 | HEXAFLUOROBUTADIENE (C4F6) CAS 685-63-2 - 10530 KG (HEXAFLUOROBUTADIENE). | XXXXXXXXXX | 0 | N/A | 1794871.33 | Japan | PERMIAN |
| 1/30/2024 | 2903590000 | HEXAFLUOROBUTADIENE (C4F6) CAS 685-63-2 - 10530 KG (HEXAFLUOROBUTADIENE). | XXXXXXXXXX | 1 | N/A | 1847661.67 | Japan | PERMIAN |
| 1/29/2024 | 2903590000 | HEXAFLUOROBUTADIENE (C4F6) CAS 685-63-2 - 10530 KG. | XXXXXXXXXX | 1 | N/A | 1847661.67 | Japan | PERMIAN |
| 1/26/2024 | 2903590000 | HEXAFLUOROBUTADIENE (C4F6) CAS 685-63-2 - 10530 KG. | XXXXXXXXXX | 1 | N/A | 1847661.67 | Japan | PERMIAN |
| 1/26/2024 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN SUBSTANCE CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | XXXXXXXXXX | 1 | N/A | 86132783.08 | Japan | GPKUZMOLOVSKY |